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MF008100 - SEMI MF81 - Test Method for Measuring Radial Resistivity Variation on Silicon Wafers StdTpc-Photolithography Metrology SEMI M1-1105 (technical revision)

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Description

SEMI M1-1105 (technical revision)

4-0298 (technical revision)

Additional requirements on the material to be tested are listed in SEMI MF1810

evaluating utility system enhancements

This Standard establishes standard dimensions to provide interchangeability for components of equivalent function

MF008100 - SEMI MF81 - Test Method for Measuring Radial Resistivity Variation on Silicon Wafers StdTpc-Photolithography Metrology SEMI M1-1105 (technical revision)The radial resistivity variation of bulk semiconductor material is an important materials acceptance requirement for semiconductor device fabrication and is also used for quality control purposes. The four point probe method provides a test that requires little specimen preparation and that is nondestructive in that the wafer is left intact. The method can be applied to wafers using the resistivity measuring apparatus and procedures of SEMI MF84 if

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